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ASTM F2113-01e1

Historical Revision

Standard Guide for Analysis and Reporting the Impurity Content and Grade of High Purity Metallic Sputtering Targets for Electronic Thin Film Applications (Withdrawn 2020)

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1.1 This guide covers sputtering targets used as thin film source material in fabricating semiconductor electronic devices. It should be used to develop target specifications for specific materials and should be referenced therein.

1.2 This standard sets purity grade levels, analytical methods and impurity content reporting method and format.

1.2.1 The grade designation is a measure of total metallic impurity content. The grade designation does not necessarily indicate suitability for a particular application because factors other than total metallic impurity may influence performance.


SDO ASTM: ASTM International
Document Number F2113
Publication Date June 10, 2001
Language en - English
Page Count 2
Revision Level 01e1
Supercedes
Committee F01.17
Publish Date Document Id Type View
June 1, 2011 F2113-01R11 Revision
June 10, 2001 F2113-01E01 Revision
June 10, 2001 F2113-01 Revision
June 1, 2007 F2113-01R07 Reaffirmation