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ASTM F1238-95(1999)

Historical Reaffirmation

Standard Specification for Refractory Silicide Sputtering Targets for Microelectronic Applications (Withdrawn 2020)

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1.1 This specification covers sputtering targets fabricated from metallic silicides (molybdenum silicide, tantalum silicide, titanium silicide, and tungsten silicide). These targets are referred to as refractory silicide targets, and are intended for use in microelectronic applications.

1.2 The values stated in SI units are regarded as standard.


SDO ASTM: ASTM International
Document Number F1238
Publication Date Dec. 10, 1999
Language en - English
Page Count 2
Revision Level 95(1999)
Supercedes
Committee F01.17
Publish Date Document Id Type View
June 1, 2011 F1238-95R11 Revision
Dec. 10, 1999 F1238-95R03 Reaffirmation
Dec. 10, 1999 F1238-95R99 Reaffirmation