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ASTM E986-04(2024)

Current Reaffirmation

Standard Practice for Scanning Electron Microscope Beam Size Characterization

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1.1 This practice provides a reproducible means by which one aspect of the performance of a scanning electron microscope (SEM) may be characterized. The resolution of an SEM depends on many factors, some of which are electron beam voltage and current, lens aberrations, contrast in the specimen, and operator-instrument-material interaction. However, the resolution for any set of conditions is limited by the size of the electron beam. This size can be quantified through the measurement of an effective apparent edge sharpness for a number of materials, two of which are suggested. This practice requires an SEM with the capability to perform line-scan traces, for example, Y-deflection waveform generation, for the suggested materials. The range of SEM magnification at which this practice is of utility is from 1000 × to 50 000 × . Higher magnifications may be attempted, but difficulty in making precise measurements can be expected.

1.2 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety, health, and environmental practices and determine the applicability of regulatory limitations prior to use.

1.3 This international standard was developed in accordance with internationally recognized principles on standardization established in the Decision on Principles for the Development of International Standards, Guides and Recommendations issued by the World Trade Organization Technical Barriers to Trade (TBT) Committee.


4.1 The traditional resolution test of the SEM requires, as a first step, a photomicrograph of a fine particulate sample taken at a high magnification. The operator is required to measure a distance on the photomicrograph between two adjacent, but separate edges. These edges are usually less than one millimetre apart. Their image quality is often less than optimum limited by the S/N ratio of a beam with such a small diameter and low current. Operator judgment is dependent on the individual acuity of the person making the measurement and can vary significantly.

4.2 Use of this practice results in SEM electron beam size characterization which is significantly more reproducible than the traditional resolution test using a fine particulate sample.

SDO ASTM: ASTM International
Document Number E986
Publication Date April 1, 2024
Language en - English
Page Count 3
Revision Level 04(2024)
Supercedes
Committee E04.11
Publish Date Document Id Type View
July 1, 2004 E0986-04 Revision
Oct. 10, 1997 E0986-97 Revision
April 1, 2024 E0986-04R24 Reaffirmation
June 1, 2017 E0986-04R17 Reaffirmation
April 1, 2010 E0986-04R10 Reaffirmation