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ASTM E1127-08

Historical Revision

Standard Guide for Depth Profiling in Auger Electron Spectroscopy (Withdrawn 2024)

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1.1 This guide covers procedures used for depth profiling in Auger electron spectroscopy.

1.2 Guidelines are given for depth profiling by the following:

Section
Ion Sputtering 6
Angle Lapping and Cross-Sectioning 7
Mechanical Cratering 8
Mesh Replica Method9
Nondestructive Depth Profiling 10

1.3 The values stated in SI units are to be regarded as standard. No other units of measurement are included in this standard.

1.4 This standard does not purport to address all of the safety problems, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.


Auger electron spectroscopy yields information concerning the chemical and physical state of a solid surface in the near surface region. Nondestructive depth profiling is limited to this near surface region. Techniques for measuring the crater depths and film thicknesses are given in (1).

Ion sputtering is primarily used for depths of less than the order of 1 μm.

Angle lapping or mechanical cratering is primarily used for depths greater than the order of 1 μm.

The choice of depth profiling methods for investigating an interface depends on surface roughness, interface roughness, and film thickness (2).

The depth profile interface widths can be measured using a logistic function which is described in Practice E 1636.

SDO ASTM: ASTM International
Document Number E1127
Publication Date Oct. 1, 2008
Language en - English
Page Count 5
Revision Level 08
Supercedes
Committee E42.03
Publish Date Document Id Type View
Oct. 1, 2024 E1127-24 Revision
June 1, 2015 E1127-08R15 Revision
Oct. 1, 2008 E1127-08 Revision
May 10, 2003 E1127-03 Revision
Sept. 10, 1997 E1127-91R97 Reaffirmation